The beginning of the 2019 saw the rolling out of two new spectrometers produced by DFAIC, winning recognition of market users and increasing our market share. DF-500 gained the most favour and DF-170 also received positive feedback.

The DF-170, developed by DFAIC research center, is equipped with an iron-etching grating based on customer’s need. Thanks to its modular design, its sub-systems can come apart and together easily, increasing the efficiency of maintenance and troubleshooting. Digital-controlled Plasma light source is being applied together with semiconductor and PWM technology. A multiple of optimized current waveform functions are built in.

The DF-500 can measure elements with wavelength above 140nm, including N. A whole new optical system was applied, which went beyond dual-optical system. The plasma light source of DFIII was applied, whose parameters were controlled automatically and adjustable. You can experience a brand new interface and selectable work curves that can be optimized as well. All spectral lines will be detected by CCD.

As a self-reliant spectrometer producer, the DFAIC has been committed to the development of world-class analytical instruments. Built on the OES and XRF series, we have get gains on the development of ICP and LIBS, followed by an approved provincial-level project: ICP-MS. This means that we have embarked on the development of mass spectrometer.